One of the most advanced electronbeam lithography (EBL) tools in the world, the Raith EBPG5200 arrived at Technion in August and is now installed in the Micro-Nano Fabrication Unit (MNFU) in the Wolfson Microelectronics Centre and Sara and Moshe Zisapel Nanoelectronics Center.
E-beam lithography is the science and art of scanning a focused beam of electrons to draw custom shapes on a surface covered with an electron-sensitive film.
The EBL provides Technion with the ability to keep Israeli nanoscale research and the high-tech industry at the cutting edge. EBL was purchased within the framework of the “Nanophotonics for Detection and Sensing” program, initiated by the Israeli National Nano Initiative and led by the Technion’s Russell Berrie Nanotechnology Institute (RBNI).
